CGHV96100F2 GaN HEMT

MACOM CGHV96100F2 Gallium Nitride (GaN) High Electron Mobility Transistor (HEMT) on silicon carbide (SiC) substrate is an internally matched (IM) FET that offers excellent power-added efficiency compared to other technologies. GaN provides superior properties to silicon or gallium arsenide (GaAs), including higher breakdown voltage, saturated electron drift velocity, and thermal conductivity.

These CGHV96100F2 GaN HEMTs also offer greater power density and wider bandwidths than GaAs transistors. This MACOM IM FET is available in a metal/ceramic flanged package for optimal electrical and thermal performance.

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